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  • Wenjian Yu; Xiren Wang
    978-3-642-54298-5
    2014
    Edition 1
    • The first book on exposing the technical details of various 3-D field solvers for RC extraction
    • Challenging issues faced by the capacitance extraction under nanometer technology are covered with the state-of-the-art techniques
    • The direct boundary element method is comprehensively introduced as an efficient modeling technique for interconnect and substrate structures with arbitrary dielectric configurations
    • Several techniques discussed have been broadly used in IC industry for RC extraction
    • Practical examples and over 60 illustrations
    • Includes supplementary material: sn.pub/extras

    €180

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