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  • R.F. Egerton
    978-1-4419-9583-4
    2011
    Edition 3
    • Considered the 'Bible of EELS'
    • Presents the only in-depth, single-author text for the still-expanding field of TEM-EELS
    • Responds to many requests for the first new edition of this classic work since 1996
    • Includes discussion of new spectrometer and detector designs, together with spectral-analysis techniques such as Bayesian deconvolution and multivariate statistical analysis
    • Provides extended discussion of anisotropic materials, retardation effects, delocalization of inelastic scattering, and the simulation of energy-loss fine structure.
    • Describes recent applications of EELS to fields such as nanotechnology, electronic devices and carbon-based materials.
    • Offers extended coverage of radiation damage and delocalization as limits to spatial resolution.
    • From reviews of the first and second edition:
    • The text....contains a wealth of practical detail and experimental insight....This book is an essential purchase for any microscopist who is using, or planning to use, electron spectroscopy or spectroscopic imaging.' – JMSA
    • Provides the advanced student with an indispensible text and the experienced researcher with a valuable reference.' -- American Scientist
    • Includes supplementary material: sn.pub/extras

    €759

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